RPS AX7695 远程等离子体源 允许对等离子体的参数

☆型号：RPS AX7695 远程等离子体源 允许对等离子体的参数

【产品详情】

R*进化8II集成远程等离子体源提供半导体晶片所需的反应气体。

处理。AX 7695集成了石英真空室、射频电源和所有必要的控制装置。

紧凑，自给的单元，方便安装在工具加工室直接为一个非常干净，

低成本的原子自由基源，在晶片上产生所需的反应，在降低的水平

复杂。

RPS AX7695远程等离子体源的具体特性和应用可能因制造商和具体配置而有所不同,但一般来说， 这种设备可能具有以下特点:

1.效性:它可能能够产性高密度的等离子体，从而提供高效的处理能力。

2.远程操作:该设备可能设计为远程操作,这意味着操作员可以在安全距离外控制等离子体的产生和应用,从而提高安全性和便利性。

3.精确控制:设备可能配备有先进的控制系统，允许对等离子体的参数(如温度励、离子密度等)进行精确控制。

4.广泛的应用:远程等离子体源在多种应用中都很有用，包括表面处理、材料改性、 薄膜沉积、刻蚀和清洁等。

5.舸靠性:这种设备可能设计为具有高可靠性，适用于连续、长时间的工作。

【英文介绍】

The R* Evolution 8II integrated remote plasma source provides the reaction gas required for semiconductor wafers.

Deal. The AX 7695 integrates a quartz vacuum chamber, RF power supply, and all necessary controls.

Compact, self-contained unit for easy installation directly in the tooling room for a very clean,

A low-cost source of atomic free radicals that produce the desired reactions on the wafer at reduced levels

Complicated.

The specific characteristics and applications of the RPS AX7695 remote plasma source may vary by manufacturer and specific configuration, but in general, such a device may have the following characteristics:

1. Efficiency: It may be able to produce high density plasma, thus providing efficient processing power.

2. Remote operation: The device may be designed to be operated remotely, meaning that the operator can control the generation and application of plasma from a safe distance, resulting in increased safety and convenience.

3. Precise control: Equipment may be equipped with advanced control systems that allow precise control of plasma parameters (such as temperature excitation, ion density, etc.).

4. Wide range of applications: Remote plasma sources are useful in a variety of applications, including surface treatment, material modification, film deposition, etching and cleaning.

5. Barge reliability: This equipment may be designed to have high reliability, suitable for continuous, long time work.

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